JPH053756B2 - - Google Patents
Info
- Publication number
- JPH053756B2 JPH053756B2 JP61011532A JP1153286A JPH053756B2 JP H053756 B2 JPH053756 B2 JP H053756B2 JP 61011532 A JP61011532 A JP 61011532A JP 1153286 A JP1153286 A JP 1153286A JP H053756 B2 JPH053756 B2 JP H053756B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- waveguide
- mesa
- cladding layer
- semiconductor laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 19
- 238000005253 cladding Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 9
- 230000031700 light absorption Effects 0.000 claims description 7
- 239000010410 layer Substances 0.000 description 32
- 239000012071 phase Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 15
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 13
- 230000003287 optical effect Effects 0.000 description 13
- 230000010355 oscillation Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000006096 absorbing agent Substances 0.000 description 4
- 238000003491 array Methods 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000005234 chemical deposition Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002109 crystal growth method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004943 liquid phase epitaxy Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
- H01S5/4068—Edge-emitting structures with lateral coupling by axially offset or by merging waveguides, e.g. Y-couplers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61011532A JPS62169389A (ja) | 1986-01-21 | 1986-01-21 | 半導体レ−ザアレイ装置 |
| US07/005,056 US4813051A (en) | 1986-01-21 | 1987-01-20 | Semiconductor laser array device |
| GB8701163A GB2187330B (en) | 1986-01-21 | 1987-01-20 | Semiconductor laser array device |
| DE19873701655 DE3701655A1 (de) | 1986-01-21 | 1987-01-21 | Halbleiterlaseranordnung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61011532A JPS62169389A (ja) | 1986-01-21 | 1986-01-21 | 半導体レ−ザアレイ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62169389A JPS62169389A (ja) | 1987-07-25 |
| JPH053756B2 true JPH053756B2 (en]) | 1993-01-18 |
Family
ID=11780577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61011532A Granted JPS62169389A (ja) | 1986-01-21 | 1986-01-21 | 半導体レ−ザアレイ装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4813051A (en]) |
| JP (1) | JPS62169389A (en]) |
| DE (1) | DE3701655A1 (en]) |
| GB (1) | GB2187330B (en]) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62282483A (ja) * | 1986-05-30 | 1987-12-08 | Sharp Corp | 半導体レ−ザアレイ装置 |
| JPS63306689A (ja) * | 1987-05-22 | 1988-12-14 | シーメンス、アクチエンゲゼルシヤフト | 横結合レーザーダイオードアレー |
| FR2642228A1 (fr) * | 1989-01-20 | 1990-07-27 | Menigaux Louis | Procede de fabrication d'un dispositif semi-conducteur quasi plat susceptible d'effet laser multi-longueurs d'onde et dispositif correspondant |
| JP2547464B2 (ja) * | 1990-04-13 | 1996-10-23 | シャープ株式会社 | 半導体レーザ素子の製造方法 |
| FR2662304B1 (fr) * | 1990-05-21 | 1992-07-24 | France Telecom | Procede de fabrication d'une structure integree guide-detecteur de lumiere en materiau semi-conducteur. |
| US5325388A (en) * | 1993-05-05 | 1994-06-28 | The United States Of America As Represented By The Secretary Of The Army | Optoelectronic waveguide neural architecture |
| JP3329764B2 (ja) * | 1999-05-13 | 2002-09-30 | 日本電気株式会社 | 半導体レーザー及び半導体光増幅器 |
| JP2006186090A (ja) * | 2004-12-27 | 2006-07-13 | Matsushita Electric Ind Co Ltd | 半導体レーザ装置およびそれを用いた光ピックアップ装置 |
| US9425917B1 (en) * | 2006-03-15 | 2016-08-23 | Neophotonics Corporation | High data rate long reach transceiver using wavelength multiplexed architecture |
| US8085825B2 (en) * | 2007-03-06 | 2011-12-27 | Sanyo Electric Co., Ltd. | Method of fabricating semiconductor laser diode apparatus and semiconductor laser diode apparatus |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4156452A (en) * | 1977-11-03 | 1979-05-29 | Sharkey Metals Limited | Furnaces |
| US4255717A (en) * | 1978-10-30 | 1981-03-10 | Xerox Corporation | Monolithic multi-emitting laser device |
| JPS57190386A (en) * | 1981-05-19 | 1982-11-22 | Nec Corp | Semiconductor laser |
| US4573163A (en) * | 1982-09-13 | 1986-02-25 | At&T Bell Laboratories | Longitudinal mode stabilized laser |
| US4594718A (en) * | 1983-02-01 | 1986-06-10 | Xerox Corporation | Combination index/gain guided semiconductor lasers |
| JPS6089990A (ja) * | 1983-10-21 | 1985-05-20 | Sumitomo Electric Ind Ltd | 光集積回路 |
| JPS60176289A (ja) * | 1984-02-22 | 1985-09-10 | Sumitomo Electric Ind Ltd | 光集積回路 |
| JPS61102087A (ja) * | 1984-10-25 | 1986-05-20 | Sharp Corp | 半導体レ−ザ装置 |
| US4742526A (en) * | 1985-01-12 | 1988-05-03 | Sharp Kabushiki Kaisha | Semiconductor laser array device |
-
1986
- 1986-01-21 JP JP61011532A patent/JPS62169389A/ja active Granted
-
1987
- 1987-01-20 GB GB8701163A patent/GB2187330B/en not_active Expired
- 1987-01-20 US US07/005,056 patent/US4813051A/en not_active Expired - Fee Related
- 1987-01-21 DE DE19873701655 patent/DE3701655A1/de active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| GB2187330B (en) | 1989-10-25 |
| GB2187330A (en) | 1987-09-03 |
| DE3701655A1 (de) | 1987-07-23 |
| GB8701163D0 (en) | 1987-02-25 |
| US4813051A (en) | 1989-03-14 |
| JPS62169389A (ja) | 1987-07-25 |
| DE3701655C2 (en]) | 1992-05-14 |
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